The exposed area is etched by conventional photosensitive glass process.
But certain condition, unexposed area is etched. I call this negative photosensitive glass proecss.
For negative photosensitive glass process,
the photosensitive glass was exposed by 308 eximer laser at ETRI(Korean national institute. General Hg lamp can be used.
After that, the glass was heat-treated and etched.
Though the glass was 1.1mm deep etched, the edge of glass remains. General photosensitive glass process will distroy the edge.
20 years ago, the holes with dia. of 50um was made through the 1.1mm thick glass by this process.
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